Single nano-digit and closed-loop scanning probe lithography for manufacturing of electronic and optical nanodevices

Next-generation electronic and optical devices demand high-resolution patterning techniques and high-throughput fabrication. Thereby Field-Emission Scanning Probe Lithography (FE-SPL) is a direct writing method that provides high resolution, excellent overlay alignment accuracy and high fidelity nanopatterns. As a demonstration of the patterning technology, single-electron transistors as well as split ring electromagnetic resonators are fabricated through a combination of FE-SPL and plasma etching at cryogenic temperatures.