Method for precisely measuring thickness of thin macromolecular coating layer

The invention discloses a method for precisely measuring thickness of a thin macromolecular coating layer. The method includes: taking a silicon wafer with the surface polished as a carrier material, and cutting the silicon wafer in a proper size to serve as a sample carrier; preparing a macromolecular coating layer on the sample carrier by adoption of a preparation process identical to that of the to-be-measured macromolecular coating layer; partially removing the coating layer on the carrier to expose the surface of the carrier; using a high-precision contourgraph to scan the surface of the to-be-measured sample and the surface of the sample carrier so as to obtain a height scan curve according to height changes, wherein a height represented by the height scan curve is equal to the thickness of the thin macromolecular coating layer. By adoption of the method, thicknesses of thin macromolecular coating layers with the thicknesses ranging from 100 nanometers to 10 micrometers can be measured accurately. In addition, the method for precisely measuring the thickness of the thin macromolecular coating layer is simple.