Rinse solution for forming pattern and pattern formation method
2015
SOLUTION: A rinse solution for forming a pattern comprises (A) heat/acid degradable polymer and (B) water.EFFECT: A pattern formation method using a rinse solution which makes it possible to prevent a pattern collapse from occurring after development and form a fine pattern can be provided. The pattern formation method allows high throughput processing, resulting in high mass productivity.SELECTED DRAWING: None
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