The metastable C49 structure in sputtered TiSi2 thin films
1988
Abstract As-deposited amorphous TiSi 2 thin films crystallize during annealing in two steps, forming the metastable C49 phase and the stable C54 phase of TiSi 2 respectively. The crystallites of the C49 phase show very complex diffraction patterns in the electron microscope. The analysis of these patterns is described.
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
5
References
8
Citations
NaN
KQI