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Chemical Vapor Deposition of MoS2 for Back-End-of-Line Applications
Chemical Vapor Deposition of MoS2 for Back-End-of-Line Applications
2021
Jun Lin
Scott Monaghan
Neha Sakhuja
Farzan Gity
Ravindra Kumar Jha
Emma M. Coleman
James P Connolly
Conor P. Cullen
Lee A. Walsh
Teresa Mannarino
Michael Schmidt
Brendan Sheehan
Georg S. Duesberg
Niall Mc Evoy
Navakanta Bhat
Paul K. Hurley
Ian M. Povey
Shubhadeep Bhattacharjee
Keywords:
Chemical vapor deposition
Optoelectronics
Back end of line
Materials science
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