Old Web
English
Sign In
Acemap
>
Paper
>
Influence of anisotropic thermal stress during a Si crystal growth on behavior of the secondary defects
Influence of anisotropic thermal stress during a Si crystal growth on behavior of the secondary defects
2017
Eiji Kamiyama
Yoshiaki Abe
Hironori Banba
Hiroyuki Saito
Susumu Maeda
Alexander Kuliev
Masaya Iizuka
Yuji Mukaiyama
Koji Sueoka
Keywords:
Stress (mechanics)
Composite material
Crystal growth
Materials science
Anisotropy
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]