Microstructure and properties of Ti2AlN thin film synthesized by vacuum annealing of high power pulsed magnetron sputtering deposited Ti/AlN multilayers

Abstract The (002) texture, compactness, and smoothness Ti2AlN thin films render them promising for many potential applications, especially in the surface modification of wear-resistant components. In this study, Ti2AlN thin films were fabricated by the vacuum annealing of Ti/AlN multilayers deposited by high power pulsed magnetron sputtering (HPPMS). The influence of the multilayer modulation ratio and modulation period of Ti/AlN on the microstructure and properties of the Ti2AlN thin film were explored. The results indicate that a Ti/AlN modulation ratio close to 6:4 and period less than 30 nm are appropriate for yielding high-quality crystallized Ti2AlN thin films. The microstructure of the Ti2AlN thin film is (002) textured, nanocrystalline, smooth, and compact, which benefits from the HPPMS technique. The Ti2AlN thin film adheres well to the substrate and has a hardness of 32.5 ± 2.1 GPa and has a friction coefficient of 0.15 while tested with a Si3N4 friction pair.