Preparation method for alloy target material applied to M-typed cathode coating film with high current density

The invention discloses a preparation method for an alloy target material applied to M-typed cathode coating film with high current density, belonging to the technical field of alloy target material preparation. On the basis of purification of raw material powders, pre-alloy powders of OsRe, OsRu, OsIr, OsRh, OsW, WRe and the like are prepared by adopting the technology of plasma spheroidization, and the acquisition of a target material with high purity and high uniformity is facilitated. By improving the uniformity of an alloy, the improvement on transmitting stability of a cathode is further facilitated. Interalloy powders with stable structures are prepared by the adoption of vacuum sintering, thus volatilization of aluminum during alloy sintering is effectively inhibited, ingredients of the alloy can be stabilized, and the uniformity of the target material is promoted. By adopting the process of multiple sections of hydrogen sintering, the target material of an osmium alloy with high density is obtained. The researched target material of osmium alloy series has the characteristics of high purity, high density and high uniformity, and meanwhile by adjusting the ingredients and the content thereof, the requirement on transmitting high current of an M-typed cathode is met.