Fabrication of Devices and Antennas for Millimeter-Wave and Terahertz Systems

We have demonstrated corrugated horn antennas at 560 GHz fabricated with a deep reactive ion etching (DRIE) process on silicon. The measurement of two of the $( 2 \times 2)560$ GHz array antenna has shown that the return loss and directivity are 13 dB and 22 dB, respectively. All of the measured antennas had below -25 dB of the cross-polarization and symmetrical beam patterns. The silicon microfabrication technique enables us to build hundreds of horn antennas at once, allowing construction of multi-pixel heterodyne imagers and spectrometers at submillimeter wavelengths.