Surface modification of AlN using organic molecular layer for improved deep UV photodetector performance
2020
A direct wide bandgap of 6.2 eV, high temperature robustness, and radiation hardness make aluminum nitride (AlN) a preferable semiconductor for deep ultraviolet (UV) photodetection. However, the pe...
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
33
References
7
Citations
NaN
KQI