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Positive Tone Nanoparticle Photoresists: New Insight on the Patterning Mechanism
Positive Tone Nanoparticle Photoresists: New Insight on the Patterning Mechanism
2016
Mufei Yu
Hong Xu
Vasiliki Kosma
Jérémy Odent
Kazuki Kasahara
Emmanuel P. Giannelis
Christopher K. Ober
Keywords:
Organic chemistry
Nanoparticle
Photoresist
Materials science
Inorganic chemistry
Photochemistry
Nanotechnology
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