A method for patterning of line-type features using a multi-patterning process, which allows the use of closer Kontakteinschlußabstandsregeln

Method with an identifying a structure for an overall target intersection mask that is used in the patterning of line-like features that a non-rectangular target opening feature having an inner concave corner, dividing the entire target interface mask pattern into first and second Zielsubstrukturen, wherein the first Zielsubstruktur a first rectangular opening feature according to a first region, but does not cover the entire non-rectangular target opening feature, and the second Zielsubstruktur a second rectangular opening feature, according to a second region, but not the entire non-rectangular target opening feature, wherein the first and second openings adjacent the inner concave overlap area, and generating first and second sets of mask data according to the first and second Zielsubstrukturen, wherein the first and / or second sets of mask data on the basis of an identified distance control are generated by contact to the end of the cutting line.