Irradiation system for a device for generative manufacturing

A radiation system (3) for a device (1) for laser-based generative manufacturing comprises a first beam source (13) a first laser beam (13A) and a second beam source (15) of a second laser beam (15A), said second laser beam (15A) having a beam quality, which is higher than that of the first laser beam (13A). Further, the irradiation system (3) a common scanner optics (21) for focusing the first laser beam (13A) and the second laser beam (13B) within a production chamber (5) of the device (1) and a beam guiding system having a first optical path (13A ') for guiding the first laser beam (13A) from the first beam source (13) for scanner optics (21) and a second beam path (15A ') for guiding the second laser beam (15A) from the second beam source (15) for scanner optics (21) wherein the beam delivery system comprises a beam combiner (19) for superimposing the beam paths of the first beam path (13A ') and the second beam path (15A').