Simulation of Temperature Dependence of Microwave Noise in Metal-Oxide-Semiconductor Field-Effect Transistors

We present results of a two-demensional (2D) numerical simulation of high-frequency noise in a short-channel metal-oxide-semiconductor field-effect transistors (MOSFET). Conventionally this noise in MOSFETs is treated as a thermal noise with a rather slow temperature dependence of the noise spectra. On contrary, the results obtained indicate that this dependence is more of an exponential kind, typical for a shot noise. Shot noise is conventionally related to a forward biased p-n junction where the current is mostly due to diffusion in the quasi-neutral region. We therefore speculate that most likely in short channel MOSFETs most of the high-frequency noise is produced not in the cut-off region of the channel but near the source side of the channel where diffusion current component is dominant.