Photosensitive resin composition and photosensitive liquid composition and photosensitive film

PURPOSE:To make it possible to easily execute the fine working of metal foil with a high precision and yield by composing the photosensitive resin composition with a specified half-esterified compound and a specified polymer. CONSTITUTION:The photosensitive resin composition comprises the half-esterified compound represented by formula I and the saturated polymer having a glass transition point 5-150 deg.C and carboxyl groups, and it can be developed by an aqueous solution of alkali. In formula I, R1 is H or methyl; R2 is methyl, ethyl, or propyl, or a halogen; l is an integer of 1-5, or R2 is H, and l is 5; m is an integer of 0.1-10; n is an integer of 2-200; Xr is a (meta) acryloyl group represented by formula II; R3 is H or methyl; and m' is an integer of 2-5; n' is an integer of 1-30, thus permitting tackiness of the surface of the film to be eliminated and removal of the film by a peeling solution composed of an aqueous solution of alkali to be accelerated.