Microstructured infrared sensor and a method for its preparation

The invention relates to a microstructured infrared sensor (6) comprising at least: a sensor chip (9), a diaphragm (12), below the membrane formed cavity (14) formed one on the diaphragm (12) thermopile structure (17) with the contacted conductor tracks (19, 20) and one on the thermopile has formed structure (17) the absorber layer (21) for absorption of infrared radiation (IR), and one on the sensor chip (9) attached cap chip (11), wherein between the cap chip (11) and the sensor chip (9) is a sensor chamber (23) is accommodated in the thermopile structure (17), wherein said infrared sensor (6) has a convexly curved lens portion (24) for focusing incident infrared radiation (IR) on the absorber layer (21). Here, the lens area (24) on top of the cap chip (11) or on the cap chip mounted (11) lens chip can be formed. The lens portion (24) may be formed by drying a varnish-dispensed droplet or a softened, patterned resist cylinder or by subsequent etching of the dried paint droplet and the surrounding substrate material.