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Boosting Ge-Epi P-Well Mobility & Crystal Quality with Si or Sn Implantation and Melt Annealing
Boosting Ge-Epi P-Well Mobility & Crystal Quality with Si or Sn Implantation and Melt Annealing
2018
John Borland
Shang-Shuin Chaung
Tseung-Yuen Tseng
Abhijeet Joshi
Bulent M. Basol
Yao-Jen Lee
Takashi Kuroi
Toshiyuki Tabata
K. Huet
Gary Goodman
Nadya Khapochkina
Temel Buyuklimanli
Keywords:
Boosting (machine learning)
Radiochemistry
Annealing (metallurgy)
Materials science
Optoelectronics
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