Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiNx Films Using Trichlorodisilane for Etch-Resistant Coatings

Su Min Hwang,Harrison Sejoon Kim,Dan N. Le,Arul Vigneswar Ravichandran,Akshay Sahota,Jaebeom Lee,Yong Chan Jung,Si Joon Kim,Jinho Ahn,Byung Keun Hwang,Lance Lee,Xiaobing Zhou,Jiyoung Kim

Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiNx Films Using Trichlorodisilane for Etch-Resistant Coatings

2021

Su Min Hwang
Harrison Sejoon Kim
Dan N. Le
Arul Vigneswar Ravichandran
Akshay Sahota
Jaebeom Lee
Yong Chan Jung
Si Joon Kim
Jinho Ahn
Byung Keun Hwang
Lance Lee
Xiaobing Zhou
Jiyoung Kim

In recent times, the requirements have become extremely stringent for employing silicon nitride (SiNx) films in various types of applications. For instance, high etch resistance coating is required...

Keywords:

Optoelectronics
Coating
Plasma
Atomic layer deposition
Materials science
Nanometre
Silicon nitride

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