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SiO2 films deposited at low temperature by using APCVD with TEOS/O3 for TFT applications
SiO2 films deposited at low temperature by using APCVD with TEOS/O3 for TFT applications
2006
Junsik Kim
Sunghyun Hwang
Junsin Yi
Keywords:
Physics
Nuclear magnetic resonance
Oxygen
Nanotechnology
Thin-film transistor
Silicon dioxide
Ozone
Inorganic chemistry
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