Predictive estimation of vacuum ultraviolet emission intensity in a low-pressure inductively coupled hydrogen plasma based on the branching ratio technique

abstract Vacuum ultraviolet (VUV) emission has recently attracted attention in low pressure processing plasmas because of the possibility of high-energy photon damages on the substrates. To quantify the VUV induced damages during the plasma processes, it is need to use of a VUV spectrometer equipped with vacuum systems not readily available in industries. In this work, therefore, we report a simple method to estimate the VUV emission intensity of hydrogen plasmas utilizing a conventional visible spectrometer widely used in plasma processes. From the measurement of hydrogen emission spectra in the visible wavelength region, the VUV emission line (Lyman-β) was calculated using the branching ratio technique and enabled the estimation of Lyman-α emission intensity based on the Boltzmann relation with given plasma parameters. In addition, it was found that the method could also predict the VUV emission intensity for high density hydrogen plasma cases by considering the self-absorption effect by hydrogen atoms.