Borontrimethyl B(CH3)3 — A less hazardous substance for boronization

Abstract Boronization, i.e. plasma induced deposition of amorphous boron containing carbon films a-C/B : H on all inner surfaces of fusion devices, has proven to be a powerful conditioning method to achieve very pure fusion plasmas. The use of the highly toxic and explosive gas diborane (B 2 H 6 ) in conventional boronization requires considerable precautions for safe handling. We report on a new technique for boronization, using less hazardous organic boron compounds, namely borontrimethyl B(CH 3 ) 3 and borontriethyl B(C 2 H 5 ) 3 . First results indicate that films can be produced from borontrimethyl showing a performance in fusion devices similar to that of layers produced in the conventional way. The new technique thus offers an easier and more convenient way for the boronization of surfaces.