Photoelastic stress analysis of different wide implant/abutment interfaces under oblique loading.

PURPOSE: There is a variety of implant/abutment (I/A) junctions for the connection of implant-supported prostheses. The aim of this work was to compare the shear stress distribution in three types of I/A interfaces after application of oblique loading on the abutments, simulating loading on an anterior tooth. MATERIALS AND METHODS: Similar wide unthreaded and cylindric implants (13.0 mm in length and 5.0 mm in diameter) and abutments were fabricated and embedded in photoelastic acrylic resin. The I/A assemblies featured three different I/A interfaces: external hex, internal hex, and internal taper. The samples were submitted to a compressive load of 0.6 kgf, which was applied to the abutment at an angle of 135 degrees. The maximum shear stresses were determined and observed at 21 points around the implants in the photoelastic models (n = 4). Graphics describing the maximum shear stress (y-axis) and the analyzed points (x-axis) were created, and the curve areas were calculated. The Kruskal-Wallis test was applied to analyze the results (P < .05). RESULTS: There were no statistically significant differences between the groups (P = .058). CONCLUSION: All of the wide-diameter I/A junctions presented similar behavior under oblique loading and appeared to be suitable to support prostheses that could receive this type of loading.