Genetic Algorithms to Improve Mask and Illumination Geometries in Lithographic Imaging Systems
2004
This paper proposes the use of a genetic algorithm to optimize mask and illumination geometries in optical projection lithography. A fitness function is introduced that evaluates the imaging quality of arbitrary line patterns in a specified focus range. As a second criterion the manufacturability and inspectability of the mask are taken into account. With this approach optimum imaging conditions can be identified without any additional a-priori knowledge of the lithographic process. Several examples demonstrate the successful application and further potentials of the proposed concept.
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