Reflection effect on the decomposition of gas-phase trichloroethene by 254 nm UV photolysis and advanced oxidation processes (AOPs)

studied. The experiments were carried out under various UV light intensities and reactor dimensions to investigate and compare the removal efficiency of the pollutant and the mineralization and dechlorination of organic intermediates by photolysis and advanced oxidation processes (AOPs). A photoreactor design equation for the photolysis of gaseous TCE in air streams by the 254 nm UV irradiation was developed without and with the consideration of the reflection effect by combining the continuity equation of the pollutant and the empirical rate expression for the photolysis of TCE. By the proposed design scheme, the temporal distribution of trichloroethene at various operation conditions by 254 nm UV photolysis can be well modeled. The UV/TiO process was found to be 2