Tolerancing analysis of customized illumination for practical applications of source and mask optimization
2010
Due to the extremely small process window in the 32nm feature generation and beyond, it is necessary to implement
active techniques that can expand the process window and robustness of the imaging against various kinds of imaging
parameters. Source & Mask Optimization (SMO) 1 is a promising candidate for such techniques.
Although many applications of SMO are expected, tolerancing and specifications for aggressively customized
illuminators have not been discussed yet. In this paper we are going to study tolerancing of a freeform pupilgram
which is a solution of SMO. We propose Zernike intensity/distortion modulation method to express pupilgram errors.
This method may be effective for tolerancing analysis and defining the specifications for freeform illumination.
Furthermore, this method is can be applied to OPE matching of free form illumination source.
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