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INFLUENCE OF EXCITATION FREQUENCY ON ORIENTED (10(-1)0) GROWTH OF ALUMINIUM NITRIDE THIN FILMS BY PECVD
INFLUENCE OF EXCITATION FREQUENCY ON ORIENTED (10(-1)0) GROWTH OF ALUMINIUM NITRIDE THIN FILMS BY PECVD
1991
N. Azema
J. Durand
R. Berjoan
J.L. Balladore
Louis Cot
Keywords:
Aluminium nitride
Metallurgy
Chemistry
Excitation
Thin film
Plasma-enhanced chemical vapor deposition
Optoelectronics
Correction
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