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Micromachined silicon antennas

1998 
The effects of a new processing procedure for creating cantilevered conductors at edges of silicon trenches at radiating edges of a silicon microstrip patch antenna and slot loop antenna are examined in this paper. It has been found that trenches with cantilevered conductors generated from the back side of a wafer can effectively reduce the effective dielectric constant of the substrate, improve radiation patterns and enhance radiation.
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