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Properties of chemical reaction during Ni and Ni-silicide deposition using Ni(PF3)4 and Si3H8
Properties of chemical reaction during Ni and Ni-silicide deposition using Ni(PF3)4 and Si3H8
2006
Ishikawa Masato
Ikuyo Muramoto
Hideaki Machida
Satoshi Imai
Atusi Ogura
Yoshio Ohshita
Keywords:
Silicide
Chemical reaction
Chemical engineering
Materials science
Deposition (chemistry)
Correction
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