Assessment of the Surface Quality of SIMOX Wafers by UV Reflectance

G. Harbeke,L. Jastrzebski

Assessment of the Surface Quality of SIMOX Wafers by UV Reflectance

1990

G. Harbeke
L. Jastrzebski

The surface quality of SIMOX wafers implanted under various conditions of implant temperature, voltage, and dose has been characterized in terms of surface contamination, roughness, and amorphization by UV reflectance spectroscopy.

Keywords:

Analytical chemistry
Thin film
Reflectivity
Ion implantation
Chemistry
Wafer
Inorganic compound
Surface finish
Inorganic chemistry
Silicon
Chemical engineering
Mineralogy

Correction
Source
Cite
Save
Machine Reading By IdeaReader

References

Citations