Low-temperature AlN film deposition using magnetic mirror-type magnetron cathode for low gas pressure operation

2020 
Low-temperature aluminum nitride (AlN) depositions were studied under low gas pressure conditions of 0.1 Pa. In order to operate under 0.1 Pa sputter-conditions, the magnetic mirror-type magnetron ...
    • Correction
    • Source
    • Cite
    • Save
    • Machine Reading By IdeaReader
    0
    References
    0
    Citations
    NaN
    KQI
    []