Measurement of small angle based on a (1 0 0) silicon wafer and heterodyne interferometer

In this paper, a new optical material application and a heterodyne interferometer are proposed for measuring small angles. In the proposed interferometer, the optical material is a (1 0 0) silicon wafer applied to compose a new architecture of small angle sensor. The small angle measurement used the phase difference which is dependent on the incident angle at the silicon wafer surface to deduce the angular variation. The proposed architecture is simple and uses the common path method to compare test and reference signals; thus, small angles can be easily and accurately measured by estimating the phase difference. The experimental results demonstrate the feasibility of this method. The angular resolution and sensitivity levels superior to 7 × 10−5° (1.3 × 10−6 rad) and 150 (deg/deg), respectively, were attainable in a dynamic range of 0.45°.