A High Stability Electrode Technology for Stacked SrBi 2 Ta 2 O 2 Capacitors

Jun Kudo,Masaya Nagata,Nobuhito Ogata,Shinobu Yamazaki,H. Urashima,Akira Okutoh,T. Miyoshi,Kazuya Ishihara

A High Stability Electrode Technology for Stacked SrBi 2 Ta 2 O 2 Capacitors

1998

Jun Kudo
Masaya Nagata
Nobuhito Ogata
Shinobu Yamazaki
H. Urashima
Akira Okutoh
T. Miyoshi
Kazuya Ishihara

A high stability electrode technology with TaSiN as a barrier metal was used to fabricate a stacked SBT capacitor array on polySi plugs, and hysteresis characteristics and contact properties of the stacked capacitor were studied.

Keywords:

Electrode
Capacitor
Inorganic chemistry
Materials science
Hysteresis
Metallurgy
Metal
Optoelectronics

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