Preparation and characterization of oriented thin films of a sulfur–nitrogen radical

Abstract Highly oriented thin films of the organic radical p- NC.C 6 F 4 .CNSSN have been prepared by thermal evaporation in high vacuum on glass and on highly oriented pyrolytic graphite (HOPG) substrates. The films are polycrystalline and crystallize in one of the known polymorphs, in the triclinic α -phase. The films exhibit a high degree of orientation with their (112) planes parallel to the surface of the substrates. No in-plane texture is observed.