Contact Engineering of Layered MoS2 via Chemically Dipping Treatments

This work was supported by NSF Grants DMR 1207213, DMR1400432, and EFRI-2DARE 1433490, and by LEAST-STARnet, a Semiconductor Research Corporation program, sponsored by MARCO and DARPA and by SRC NRI SWAN. This work was also supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIT) (Nos. NRF-2018R1C1B5085644 and NRF-2019R1A2B5B02070657).