New Photosensitive Dielectric Material for High-Density RDL with Ultra-Small Photo-Vias and High Reliability

Abstract This paper presents an advanced ultra-thin photosensitive dielectric Film (PDM) newly developed with high resolution, low CTE and low residual stress for next-generation high-density redistribution layer (RDL), 2.5D interposer, and high-density fan-out package applications. For high-density RDL, photosensitive dielectric materials need to have low CTE to achieve high package reliability. The CTE of the material is 30–35ppm/K. While maintaining the low CTE, we successfully demonstrated the minimum micro-via diameter of 3um in the 5um thickness. Curing temperature of the PDM is 180°C × 60 min. which is lower than most of the advanced dielectric materials which currently used in industry. Low-temperature curing process results in low stress. We have calculated residual stress in the cured PDM from a test result of warpage measurement on 4 inch wafer. As another benefit of the PDM material in curing process, the PDM can be cured in air oven. Most of advanced photo dielectric materials need to cure in...