Low Fringe-Field And Narrow-Track MR Heads

The ABS focused ion beam technique was utilized to pattern MR heads into different geometry at track edges to study side-writing performance. By spinstand testing, both written track width and erase distance were measured. An analytical model was developed to analyze the dependence of the side-writing on the etching step length. Effects of the etching width, which affects the total etching time, were also studied.