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Ferroelectric-Like Behavior in TaN/High-k/Si System Based on Amorphous Oxide
Ferroelectric-Like Behavior in TaN/High-k/Si System Based on Amorphous Oxide
2021
Ze Feng
Yue Peng
Yang Shen
Zhiyun Li
Hu Wang
Xiao Chen
Yitong Wang
Meiyi Jing
Feng Lu
Weihua Wang
Yahui Cheng
Yi Cui
An Dingsun
Genquan Han
Hui Liu
Hong Dong
Keywords:
Materials science
High-κ dielectric
oxygen vacancy
Chemical engineering
Ferroelectricity
Amorphous solid
amorphous oxide
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