Old Web
English
Sign In
Acemap
>
Paper
>
Effect of Ti deposition temperature on TiSi2 orientation and its thermal instability in heavility doped Si
Effect of Ti deposition temperature on TiSi2 orientation and its thermal instability in heavility doped Si
1996
Byung-Jin Cho
Bh Park
Sh Yu
Jong Choul Kim
Keywords:
Thermal
Instability
Doping
Photochemistry
Materials science
thermal instability
Composite material
deposition temperature
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]