The organic material vapor generator, deposition source, the deposition apparatus

Without it increases the deposition rate to form a thin film of uniform thickness. Supplying an organic material 48 in the evaporation chamber 20a from the supply device 40, when evaporated on the evaporation surface 28 of the evaporator 24 to heat the heating filter 32 provided in advance, and heating a flow of carrier gas therein , it is introduced into the evaporation chamber 20a. The organic material vapor and the carrier gas generated is mixed, the mixed gas is introduced into the discharge device 70. If only the organic material vapor is introduced into the discharge device 70 is the molecular flow in the discharge device 70 will be formed, viscous flow is formed the pressure in the discharge apparatus 70 by the carrier gas is increased , the gas mixture filling the discharge apparatus 70, is uniformly discharged. The organic material is supplied in small portions, it may be so the deposition rate is not too fast.