Epitaxial-like Growth of Anisotropic Mesostructure on an Anisotropic Surface of an Oblique Nanocolumnar Structure

Tetrahedral amorphous carbon (ta-C) films with nanoscale structural anisotropy, which are obliquely deposited on a substrate by a filtered cathodic vacuum arc deposition (FAD) technique, allow anisotropic growth of mesostructured silica films thereon. The ta-C films have a uniformly tilted nanoscale columnar structure, which is caused by the self-shadowing effect during the oblique deposition, and consequently, the surface of the film can be morphologically anisotropic when the deposition angle is large enough. When silica films with a two-dimensional hexagonal mesostructure are grown under hydrothermal conditions on these ta-C films, the cylindrical mesochannels are aligned perpendicularly to the deposition direction of ta-C. The distribution of the in-plane alignment direction of the mesochannels can be controlled by the deposition angle of ta-C; it becomes narrower with the increase of the deposition angle and the consequent increase of the surface roughness. The observed alignment of the mesochannels ...