Microstructure and Residual Stress Measurement of Ag/Glass Thin Films Using In-Situ High-Temperature X-ray Diffraction

In this study pure Ag particles were deposited on the glass substrate using DC magnetron sputtering at room temperature and Ag thin film with 80nm thickness was prepared. To investigation the effect of high temperature on the crystal structure of Ag thin film, an in-situ HT-XRD instrument has been used. Microstructural properties of Ag thin film have been studied in several temperatures. Micrograin size of different atomic planes of Ag thin film during HT-XRD process was calculated. Residual stress of as-deposited and post annealed Ag thin film at (111) planes was measured using Sin2ψ method.