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Evaluation Model of Neutral Particles Behavior Influence upon Contact Profile in C4F8-Based Dry Etch
Evaluation Model of Neutral Particles Behavior Influence upon Contact Profile in C4F8-Based Dry Etch
2011
Alexander Chamov
Alexey Korovkin
Andrey Krasnikov
Sergey Yanovich
Keywords:
Composite material
Dry etching
Materials science
Correction
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