Old Web
English
Sign In
Acemap
>
Paper
>
Method for monitoring silicon epitaxial growth process in minimal CVD reactor
Method for monitoring silicon epitaxial growth process in minimal CVD reactor
2018
Mitsuko Muroi
Miya Matsuo
Hitoshi Habuka
Takanori Mikahara
Shin-Ichi Ikeda
Yuuki Ishida
Shiro Hara
Keywords:
Epitaxy
Analytical chemistry
Materials science
Silicon
Optoelectronics
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]