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A 0.24 μm SiGe BiCMOS mixed-signal RF production technology featuring a 47 GHz f t HBT and 0.18 μm L ett CMOS
A 0.24 μm SiGe BiCMOS mixed-signal RF production technology featuring a 47 GHz f t HBT and 0.18 μm L ett CMOS
1999
S. St Onge
David L. Harame
J. Dunn
Seshadri Subbanna
David C. Ahlgren
Gregory G. Freeman
B. Jagannathan
J. Jeng
Kathryn T. Schonenberg
Kenneth J. Stein
Robert A. Groves
D. Coolbaugh
Natalie B. Feilchenfeld
Peter J. Geiss
Michael S. Gordon
Peter B. Gray
D. Hershberger
S. Kilpatrick
R. Johnson
Alvin J. Joseph
Louis D. Lanzerotti
John C. Malinowski
B. Orner
M. Zierak
Keywords:
Electrical engineering
Radio frequency
cmos process
Heterojunction bipolar transistor
BiCMOS
Physics
Silicon-germanium
Space technology
Mixed-signal integrated circuit
CMOS
Optoelectronics
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