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Improvement of the MoS 2 thin film quality deposited by low-temperature MOCVD using Mo precursor i-Pr 2 DADMo(CO) 3
Improvement of the MoS 2 thin film quality deposited by low-temperature MOCVD using Mo precursor i-Pr 2 DADMo(CO) 3
2021
Kota Yamazaki
Yusuke Hibino
Yusuke Hashimoto
Hideaki Machida
Masato Ishikawa
Hiroshi Sudoh
Hitoshi Wakabayashi
Atushi Ogura
Keywords:
Metalorganic vapour phase epitaxy
Optoelectronics
Materials science
Thin film
quality
Correction
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