Dimensional Metrology with the NIST Calibrated Atomic Force Microscope | NIST

Atomic force microscopes (AFMs) are increasingly used in the semiconductor industry as tools for sub-micrometer dimensional metrology. The scales of an AFM must be calibrated in order to perform accurate measurements. We have designed and developed the calibrated AFM (C-AFM) at the National Institute of Standards and Technology (NIST) to calibrate standards. Specifically, our primary calibrations are expected to be ofcombined pitch/height, or three dimensional magnification standards for AFM. The C-AFM has metrology traceable to the International System of Units (SI, from Systeme International d'Unites) meter for all three axes. This is accomplished through the integration of a flexure x-y translation stage, heterodyne laser interferometers, and a z-axis piezoelectric actuator with an integrated capacitance sensor. Our first pitch measurements for an