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Comparison of Ion Implantation Resistance between Commercial KrF and ArF Photoresists
Comparison of Ion Implantation Resistance between Commercial KrF and ArF Photoresists
2012
S. S. Hong
Hyung-Rae Lee
Siyoung Lee
Jae-ho Kim
Dong-jun Lee
Kyung-Mee Kim
Sue Kim
Jung-Sik Choi
Jong-Soo Kim
Keywords:
Ion implantation
Photochemistry
Photoresist
Materials science
Shrinkage
block layer
Chemical engineering
Correction
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