Temperature Dependence of Electron Mobility in InGaAs/InAlAs Heterostructures

Temperature dependence of the electron mobility in modulation-doped InGaAs/InAlAs single heterostructures has been investigated by Hall effect measurements in the temperature range from 15 K to 300 K in order to clarify the scattering mechanisms of the electrons. Two kinds of samples are used with doping densities in the InAlAs barrier layer, ND=3×1017 cm-3 and 1×1018 cm-3. The measured electron mobility is compared with the calculated values by taking into account the scattering by InAs-like and GaAs-like LO phonons in the InGaAs channel layer, in addition to the acoustic deformation potential, piezoelectric, ionized impurity, alloy disorder and interface roughness scatterings. The calculated electron mobility shows a good agreement with the experimental data when the alloy disorder potential is assumed to be about 0.7 eV.