Overlapping alignment mark and substrate with the same

The invention provides an overlapping alignment mark and a substrate with the same. The overlapping alignment mark is arranged on the substrate. The substrate comprises a basic layer and a plurality of sheet layers which are arranged on the basic layer. The overlapping alignment mark comprises the components of: a basic layer alignment mark which is arranged on the marking layer of the basic layer; and sheet layer alignment marks which are arranged on corresponding sheet layers, wherein at least two sheet layers in the sheet layers which are provided with the sheet layer alignment marks realize alignment with the basic layer through a position relationship between the corresponding sheet layer alignment mark and a same basic layer alignment mark. According to the overlapping alignment mark configuration mode of the invention, more mark areas such as drawing groove are released, thereby saving the marking area which is occupied by the overlapping alignment mark.