Role of buried oxide microstructure in dosimetry of implanted oxygen in SIMOX technology

In this paper, we present and discuss the role of the microstructure of the buried oxide of standard dose SIMOX in controlling of the accuracy and reproducibility of the implanted oxygen dose in SIMOX technology. Specific effects of implant process conditions on the buried oxide microstructure are shown. The discussion is supported by the data from large number of processes. Implications for low dose SIMOX manufacture are addressed.